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National Repository of Grey Literature 3 records found  Search took 0.00 seconds. 
Controlled structuring of self-assembled polystyrene microsphere arrays by two different plasma systems
 Domonkos, Mária ; Ižák, Tibor ; Stolcova, L. ; Proška, J. ; Kromka, Alexander
In this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres (PM) with diameter of 471 nm was used as the primary template. The PM templates were processed in two different RIE systems: (i) capacitively coupled radiofrequency plasma (CCP) and (ii) dual plasma system which combines CCP and pulsed linear-antenna microwave plasma (PLAMWP). The influence of process conditions on the PM geometry was systematically studied by scanning electron microscopy (SEM). It was found out that choosing optimal parameters results in a tunable diameter of PM with various shapes (from spheres to pyramid-like structures) while keeping their periodic hexagonal ordering.
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Controlled structuring of self–assembled polystyrene microsphere arrays by two different plasma systems
 Domonkos, Mária ; Ižák, Tibor ; Štolcová, L. ; Proška, J. ; Kromka, Alexander
In this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres (PM) with diameter of 471 nm was used as the primary template. The PM templates were processed in two different RIE systems: (i) capacitively coupled radiofrequency plasma (CCP) and (ii) dual plasma system which combines CCP and pulsed linear-antenna microwave plasma (PLAMWP). The influence of process conditions on the PM geometry was systematically studied by scanning electron microscopy (SEM). The process conditions were controlled by varying radiofrequency (RF) power, gas mixture (O2:CF4 ratio) and process duration.
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Reactive ion etching of polystyrene microspheres
 Domonkos, Mária ; Ižák, Tibor ; Štolcová, L. ; Proška, J. ; Kromka, Alexander
This article gives a brief insight also into the principle of the nanosphere lithography and various plasma systems focusing on their properties and applicability for a subsequent topographical modification of surfaces prepared by NS lithography. In the experimental part of this study we present a successful manipulation of microspheres by reactive ion etching (RIE). A self-assembled monolayer close-packed array of monodisperse polystyrene microspheres is used as the primary template. The polystyrene microspheres (PM) were processed in capacitively coupled radiofrequency plasma (CCP) RIE system. The influence of process conditions on the PM geometry is systematically studied by scanning electron microscopy. The process conditions are controlled by varying radiofrequency power, total pressure, composition of the gas mixture (ratio O2:CF4) and process duration.
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